● Furnace

● 장비 스펙

​​  → ​Annealing temperature : 10~550℃

​  → ​​Sample stage : 90×90mm

​  → ​​Annealing​ ambient : N₂, O₂, Air, Vacuum (<~3 × 10^-2)​

● Simultaneous Ultraviolet and Thermal

● Rapid Thermal Annealing

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