Advanced Physics on Electromaterial Laboratory Welcome to APEL
Equipment
| SE (정성적 결함 분석) | |
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● Spectroscopic ellipsometry
정성적 결함 분석 장비 - 편광된 빛을 시편에 입사시켜, 반사되는 빛의 편광 상태의 변화 분석 - 박막 시편의 두께, 유전율, 광학적 굴절률, 흡광계수, 투과율, 반사율을 파장의 함수로 알 수 있는 기술 - 광학적 특성이 비등방(anisotropic)인 시편 또한 분석 가능
1. Spectral Range - D : 193 nm to 1000 nm, 800 wavelengths - NIR extension : 1,005 nm to 1,690 nm, 275 wavelengths 2. Spectral Resolution Bandwidth - U, X, D : 1 nm wavelength spacing, < 2.5 nm FWHM - NIR extension : 2.5 nm wavelength spacing, < 3.5 nm FWHM 3. Measurement Quantities - spectroscopic ellipsometry : Ψ = 0 ~ 90 ° and Δ = 0 ~ 360 °, N, C, and S - intensity : % Transmission and % reflection - depolarization : % depolarization - generalized ellipsometry : AnE, Asp, and Aps(3 rations of generalized jones matrix) - mueller matrix : All 15 normalized elements of the mueller matrix 4. straight-through accuracy : ten second measurement of empty-beam, met by 95 % of all wavelengths - models U, X, or D and NIR - Psi : 45 ° ± 0.02 - Delta : 0 ° ± 0.05 - Depolaized Mueller Matrix elements - Diagonal : 1 ± 0.002 - Off-Diagonal : 0 ± 0.002 5. Thickness Precision - Thirty consecutive(static) ten second measurements of nominally 25 nm SiO2/Si - Standard deviation in thickness < 0.005 nm
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| 이전글 | DLTS&PICTS (정량적 결함 분석 장비) |
| 다음글 | E-beam (박막 증착 시스템) |
